Substrate transfer apparatus, substrate transfer module, substrate transfer method and computer readable storage medium

ABSTRACT

Disclosed is a substrate transfer apparatus including a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding a substrate, the apparatus including: a heating unit for heating the arm portion; a temperature detection unit for detecting a temperature of the arm portion; and a control unit for heating the arm portion by the heating unit prior to a start of a transfer of the substrate, allowing the transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and then controlling the heating unit so as to maintain the temperature detection value within the preset temperature range.

TECHNICAL FIELD

The present invention relates to a substrate transfer apparatus for transferring a substrate; a substrate transfer module including the substrate transfer apparatus; substrate transfer method; and a computer readable storage medium storing the substrate transfer method therein; and, more particularly, the present invention pertains to a technique for improving an accuracy of a transfer position to which a substrate is transferred.

BACKGROUND ART

In a manufacturing process of a semiconductor device or a flat panel such as a liquid crystal display or the like, a substrate called a semiconductor wafer (hereinafter simply referred to as “wafer”) or a glass substrate accommodated in a carrier, and after the carrier is loaded into a loading port of a semiconductor manufacturing apparatus (including a flat panel manufacturing apparatus), the substrate is taken out of the carrier by a transfer arm in the apparatus and then is transferred into a processing module. In case that the processing module is a vacuum processing module of a single sheet type or a spinner used in a resist process or the like, it is required to align the center of the substrate with the center of a mounting unit in the module with a high accuracy. Thus, the quality of the performance of the transfer arm affects a processed result of the substrate.

One example of such substrate processing apparatus is a so-called multi-chamber system including a plurality of processing chambers (processing modules) for performing an etching process or a film forming process by CVD (Chemical Vapor deposition); and a common transfer chamber having a transfer arm therein and connected with the respective processing chambers. In the film forming process or the etching process, the wafer needs to be accurately mounted on a predetermined position in each processing chamber. If the mounting position of the wafer is deviated, there may be incurred non-uniformity between wafer surfaces in view of obtained film thicknesses, etched line widths, and so forth.

To solve this problem, an example technique for improving the accuracy of the transfer position of the substrate (hereinafter, referred to as “controllability”) transferred into the substrate processing apparatus such as the multi-chamber system is disclosed in Patent Document 1 wherein a transfer arm of a joint type (frog leg type) is given an improved controllability by suppressing a deterioration of a movement resolution in a state that the transfer arm is extended. Further, Patent Document 2 discloses a transfer arm a joint type (scalar type) having a conveyance mechanism in an arm unit constituting the transfer arm.

-   [Patent Document 1]: Japanese Patent Laid-open Publication No.     2000-100888 (Paragraph [0038] and FIG. 1) -   [Patent Document 2]: Japanese Patent Laid-open Publication No.     2000-72248 (FIG. 2)

DISCLOSURE OF THE INVENTION

[Problems to be Solved by the Invention]

In general, a transfer arm includes a driving mechanism such as a motor or the like, or a conveyance mechanism such as a pulley, a timing belt, or the like, wherein the driving mechanism or the conveyance mechanism suffers a heat generation due to thermal loss or friction. Thus, if the transfer arm is operated for a long period of time, the temperature of the transfer arm may be increased higher than that in case the transfer arm is stopped (hereinafter, this state will be referred to as a “warm-up state”).

Meanwhile, when the operation of the transfer arm is stopped during, for example, a maintenance process or closing time of a factory, the supply of the heat from the above-stated heat source is stopped. Therefore, immediately after the operation of the transfer arm is resumed, the temperature of the transfer arm resides in a lower temperature state (hereinafter, this state will be referred to as a “cool-down state”) than the warm-up state. If the transfer arm is operated under the different temperature conditions between the warm-up state and the cool-down state, a stop position of the transfer arm may be deviated slightly by, e.g., a sub millimeter between these two states. With such a small amount of deviation, however, the accuracy of the transfer position of the substrate may be degraded. In the event that a joint type transfer arm is used, the reason for the occurrence of such deviation is deemed to be due to, e.g., a variation in a pressure by which a bearing presses a rotational axis of the transfer arm, or a variation in a tension of the timing belt of the conveyance mechanism as result of being extended.

To resolve the deterioration of the controllability due to the variation of the temperature of the transfer arm, it is conjectured to be desirable to perform a so-called warm-up operation for operating only the transfer arm without processing the wafer, and then to start the processing of the wafer after the transfer arm turns into the warm-up state. However, since it takes, e.g., about several hours to return the transfer arm in the cool-down state into that in the warm-up state, the execution of the warm-up operation results in a great reduction in the operation rate of the apparatus. For the reason, the transfer arm actually has been required to be designed to exhibit some degree of fine controllability in both the cool-down state and the warm-upstate. Thus, if only the warm-up state is considered, for example, it is hard to say that the transfer arm displays an optimum controllability.

In this regard, Patent Document 1 and Patent Document 2 do not mention anything about improving the controllability of the transfer arm in consideration of the influence of the temperature variation between the warm-up state and the cool-down state.

The present invention has been conceived to solve the aforementioned problems, and the object of the present invention is to provide a substrate transfer apparatus capable of performing a transfer of the substrate with a desired accuracy immediately after its operation is resumed, regardless of the cool-down state or the warm-up state, and also capable of obtaining a high uniformity between processes on substrates; and, also, to provide a substrate transfer module including the substrate transfer apparatus, a substrate transfer method and a storage medium storing the substrate transfer method therein.

[Means for Solving the Problems]

In accordance with a first aspect of the present invention, there is provided a substrate transfer apparatus including a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding a substrate, the apparatus including: a heating unit for heating the arm portion; a temperature detection unit for detecting a temperature of the arm portion; and a control unit for heating the arm portion by the heating unit prior to a start of a transfer of the substrate, allowing the transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and then controlling the heating unit so as to maintain the temperature detection value within the preset temperature range.

Here, a lower limit of the preset temperature range may be set to be a temperature higher than a temperature of the arm portion where an equilibrium state is obtained as a result of operating the transfer arm for a long period of time without performing the heating by the heating unit. Further, it is desirable that the control unit controls the transfer arm to perform a warm-up operation, in which the transfer arm is operated without performing the transfer of the substrate, during a period of heating the arm portion prior to the transfer of the substrate. Furthermore, the control unit controls the transfer arm to stop the transfer of the substrate when the temperature of the arm portion is out of the preset temperature range during the transfer of the substrate, and a thermostat for preventing overheating of the arm portion may be installed at the arm portion.

Further, it is desirable that, when the transfer arm is used under an atmosphere in which corrosive components are dispersed, the preset temperature range is set to be a temperature range in which adhesion of the corrosive components can be suppressed. It is desirable that, when the transfer arm is used under an atmosphere in which a reaction product of a processing gas is adhered thereto, the temperature control unit controls the heating unit to heat the arm portion at a temperature higher than the preset temperature range to disperse components adhered to the arm portion while the transfer of the substrate by the arm portion is not being performed. Further, it is suitable that, when the transfer arm is used in a transfer chamber under a vacuum atmosphere, the temperature control unit heats the arm portion by controlling the heating unit to evaporate moisture of the arm portion in a step of depressurizing the transfer chamber.

In accordance with a second aspect of the present invention, there is provided a substrate transfer module, including: the substrate transfer apparatus; a transfer chamber for allowing a transfer of a substrate to be performed therein by the transfer arm; and a second heating unit for increasing a temperature of the inside of the transfer chamber and a second temperature detection unit for detecting the temperature of the inside of the transfer chamber, both of which are installed in the transfer chamber. The control unit controls the second heating unit so as to maintain the temperature of the inside of the transfer chamber in the preset temperature range based on a temperature detection value obtained by the second temperature detection unit during the transfer of the substrate.

In accordance with a third aspect of the present invention, there is provided a substrate transfer apparatus including a transfer arm of a slide type having a rotatable transfer base body and a holding portion, installed at the transfer base body to be movable back and forth, for holding a substrate, the apparatus including: a heating unit for heating the transfer base body; a temperature detection unit for detecting a temperature of the transfer base body; and a control unit for allowing a transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and controlling the heating unit so as to maintain the temperature detection value within the preset temperature range.

In accordance with a fourth aspect of the present invention, there is provided a substrate transfer method for transferring a substrate by using a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding the substrate, the method including: detecting a temperature of the arm portion; heating the arm portion prior to a start of a transfer of the substrate; allowing the transfer of the substrate after the detected temperature of the arm portion reaches a preset temperature range; and maintaining the temperature of the arm portion within the preset temperature range while heating the arm portion.

Here, it is desirable that a lower limit of the preset temperature range is set to be a temperature higher than a temperature of the arm portion where an equilibrium state is obtained as a result of operating the transfer arm for a long period of time without performing the heating by the heating unit. Further, the substrate transfer method may further include: performing a warm-up operation, in which the transfer arm is operated without performing the transfer of the substrate, during a period of heating the arm portion prior to the start of the transfer of the substrate; and stopping the transfer of the substrate when the temperature of the arm portion is out of the preset temperature range during the transfer of the substrate.

In accordance with a storage medium of the present invention, the storage medium stores therein a program for operating a substrate transfer apparatus including a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding the substrate, wherein the program is composed of steps to execute each substrate transfer method capable of providing the above-mentioned features.

[Effect of the Invention]

In accordance with the present invention, a heating unit is installed at an arm portion of a joint type transfer arm or a transfer base body of a slide type transfer arm, and a temperature of the arm portion is compulsively increased by heating the arm portion or the like at the time of startup of a substrate transfer apparatus, thus allowing the transfer of a substrate to be carried out in a set temperature range. Accordingly, when the operations of the apparatus are stopped for a long period of time and then resumed thereafter, for example, the apparatus turns into a warm-up state immediately, so that it becomes possible to perform the transfer of the substrate with an originally desired precision immediately after resuming the operation. Accordingly, for example, since in case that the substrate is transferred into a processing module by the substrate transfer apparatus, mounting position of the substrate in the processing module become uniform between the substrates, a high uniformity of the processing on the substrate can be obtained. As described, the present invention has advantages when it is applied to the semiconductor manufacturing apparatuses in which the deviation of the mounting position of the substrate would affect the uniformity of the processing, however small the deviation is.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 provides a plane view of a substrate processing apparatus in accordance with an embodiment of the present invention;

FIG. 2 sets forth a longitudinal cross sectional view of the substrate processing apparatus;

FIG. 3 presents a longitudinal cross sectional view illustrating an internal configuration of a first transfer apparatus incorporated in the substrate processing apparatus;

FIG. 4 offers a perspective view of a multi-joint arm included in the first transfer apparatus;

FIG. 5 depicts a program diagram illustrating an electrically connected configuration of a substrate transfer apparatus in accordance with the embodiment of the present invention;

FIG. 6 is a flowchart illustrating an operational sequence according to a temperature control and an operation control of a transfer arm; and

FIGS. 7A and 7B provide a perspective view and a longitudinal cross sectional view of a slide type substrate transfer apparatus in accordance with another embodiment of the present invention.

EXPLANATION OF CODES

W Wafer

1 a First substrate transfer apparatus

1 b Second substrate transfer apparatus

4 Substrate processing apparatus

7 Control unit

8 Slide type substrate transfer apparatus

10 a, 10 b Transfer arms

11 Revolving arm portion

11 a Casing

12 Intermediate arm portion

12 a Casing

13 Leading end arm portion

13 a Wafer holding portion

20 a˜20 g bearing portions

21 Rotational shaft

21 a Through hole

22 Revolving shaft

22 a Wiring path

23, 24 Pulleys

25 a, 25 b Timing belts

26 a Rotational shaft

26 b Supporting shaft

26 c Wiring path

27, 28 Pulleys

29 Rotational shaft

29 b Supporting shaft

30 Driving mechanism

31 Cover member

31 a Through hole

41 Carrier mounting table

42 First transfer chamber

42 a Fan filter unit

42 b Exhaust unit

43 Load lock chamber

44 Second transfer chamber

45 a˜45 d Substrate processing chambers

46 Alignment chamber

51 Mounting table

52 Gas shower head

61 a, 61 b Heaters

62 Connection line

63 a, 63 b Automatic temperature controller

64 a, 64 b Thermocouples

65 Signal line

66 Power supply unit

71 Central processing unit (CPU)

72 Temperature control program

73 Operation control program

74 Memory

75 Display manipulation unit

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, a substrate transfer apparatus in accordance with an embodiment of the present invention will be described with respect to a multi-chamber type substrate processing apparatus 4, for example. FIG. 1 is a plane view of the substrate processing apparatus 4 in accordance with the embodiment of the present invention, and FIG. 2 is a longitudinal cross sectional view thereof. The substrate processing apparatus 4 includes, e.g., three carrier mounting tables 41, each for mounting thereon a carrier C which accommodates therein a preset number of wafers W to be processed; a first transfer chamber 42 for transferring a wafer W under an atmospheric atmosphere; two load lock chambers 43 arranged in left and right sides, for accommodating the wafer W in a standby state before transferred, while switching their inside atmosphere between an atmospheric atmosphere and a vacuum atmosphere; a second transfer chamber 44 for transferring the wafer W under a vacuum atmosphere; and four substrate processing chambers 45 a to 45 d for performing certain processes on the loaded wafer W. These respective units are arranged in the order of the first transfer chamber 42, the load lock chamber 43, the second transfer chamber 44 and the substrate processing chambers 45 a to 45 d along a loading direction of the wafer W, and neighboring units are airtightly connected to each other by doors G1 or gate valves G2 to G4. Further, the following description will be provided by defining one side of the first transfer chamber 42 as a front side.

As illustrated in FIG. 1, the carrier C mounted on the carrier mounting table 41 is connected to the first transfer chamber 42 by the door G1, and as illustrated in FIG. 2, the door G1 carries out a function of opening or closing a lid of the carrier C. Further, a fan filter unit 42 a including a fan for sending air into the chamber and a filter for purifying the air is disposed in a ceiling portion of the first transfer chamber 42, and an exhaust unit 42 b is disposed at a bottom portion of the first transfer chamber 42 facing the fan filter unit 42 a. With this configuration, a descending current of clean air is generated inside the first transfer chamber 42. Installed in the first transfer chamber 42 is a transfer arm 10 a for taking out and transferring the wafers W from the carrier C one by one. The transfer arm 10 a is configured to be rotatable, extensible and contractible, and movable up and down and left and right. A detailed configuration of the transfer arm 10 a will be explained later. Further, as illustrated in FIG. 1, an alignment chamber 46 having therein an orienter for performing a position alignment of the wafer W is installed at a lateral portion of the first transfer chamber 42.

Each of the left and right load lock chambers 43 includes a mounting table 43 a for mounting thereon the wafer W loaded therein (FIG. 2), and is connected to a vacuum pump and a leakage valve (not shown) for switching the atmosphere of inner space of the load lock chamber 43 between the atmospheric atmosphere and the vacuum atmosphere.

As can be seen from FIG. 1, the second transfer chamber 44 has, for example, a hexagonal plane shape, and its front two sides are connected to the load lock chambers 43 while the other four sides of the second transfer chamber 44 are connected to the substrate processing chambers 45 a to 45 d. Installed inside the second transfer chamber 44 is a second transfer arm 10 b for transferring the wafer W under the vacuum atmosphere between the load lock chambers 43 and the substrate processing chambers 45 a to 45 d, wherein the second transfer arm 10 b is configured to be rotatable and extensible/contractible. Further, second transfer chamber 44 is connected to a non-illustrated vacuum pump which maintains the inside of the second transfer chamber 44 under the vacuum atmosphere.

Each of the substrate processing chambers 45 a to 45 d includes, for example, a mounting table 51 for mounting the wafer N thereon, and a gas shower head 52 for supplying a processing gas. Further, the substrate processing chambers 45 a to 45 d are connected to a non-illustrated vacuum pump. In this configuration, the substrate processing chambers 45 a to 45 d are configured as processing modules to carry out various processes performed under the vacuum atmosphere, for example, an etching process using an etching gas, a film forming process using a film forming gas, an ashing process using an ashing gas, and the like. The processes performed by the substrate processing chambers 45 a to 45 d may be identical to or different from each other. Further, the transfer arms 10 a and 10 b, the substrate processing chambers 45 a to 43 d, and so forth are connected to a control unit which controls the whole operation of the substrate processing apparatus 4.

In the above-stated configuration, the wafer W stored in the carrier C on the carrier mounting table 41 is taken out of the carrier C by the transfer arm 10 a and is transferred into the first transfer chamber 42. While in the first transfer chamber 42, the wafer W is aligned in the alignment chamber 46, and after that, the wafer W is transferred into either one of the left and right load lock chambers 43 to be in a standby state therein. Thereafter, if the inside of the load lock chamber 43 is turned into a vacuum atmosphere, the wafer W is taken out of the load lock chamber 43 by the transfer arm 10 b to be transferred into the second transfer chamber 44, and then is conveyed into one of the substrate processing chambers 45 a to 45 d to be subjected to a preset process therein. Here, if the substrate processing chambers 45 a to 45 d perform a series of different processes, the wafer W is transferred between the second transfer chamber 44 and the respective substrate processing chambers 45 a to 45 d necessary for performing the series of processes. After the necessary processes are completed, the wafer W is unloaded via the reverse path (except the alignment chamber 46) as that for the loading thereof and is stored in the carrier C again.

As described above, the substrate processing apparatus 4 in accordance with the embodiment of the present invention includes the first and second transfer arms 10 a and 10 b for transferring the wafer W in the apparatus, and each of the transfer arms 10 a and 10 b has a driving mechanism such as a motor and a conveyance mechanism made up of a pulley or a timing belt. Here, to prevent a deviation of a transfer position of the wafer W due to a temperature variation between a cool-down state and a warm-up state as mentioned in the description of the background art, the transfer arms 10 a and 10 b have a heating unit to reduce an influence of the temperature variation and carry out the transfer of the wafer W with a high accuracy. Hereinafter, a detailed configuration of substrate transfer apparatuses 1 a and 1 b (FIG. 5) and the heating unit will be explained. The aforementioned transfer arms 10 a and 10 b respectively installed in the above-described first and second transfer chambers 42 and 44 are parts of the substrate transfer apparatuses 1 a and 1 b, respectively. The substrate transfer apparatus 1 a and 1 b include the transfer arms 10 a and 10 b and the control unit 7 for controlling the operation and temperature thereof, as illustrated in FIG. 5. Since the substrate transfer apparatuses 1 a and 1 b have analogous configuration, the following description will be provided only for the second substrate transfer apparatus 1 b. Further, though the present inventor has actually developed a substrate transfer apparatus including two joint type transfer arms in each transfer chamber, the present embodiment will be explained for the substrate transfer apparatuses 1 a and 1 b each having only one transfer arm for the simplicity of illustration and description.

First, the configuration and operation of the transfer arm 10 b will be first explained simply. FIG. 3 is a longitudinal cross sectional view showing the internal configuration of the transfer arm 10 b included in the second substrate transfer apparatus 1 b, and FIG. 4 is a perspective view showing the external appearance thereof. As illustrated in FIGS. 3 and 4, the transfer arm 10 b is configured as a well-known join-type (scalar type) transfer arm having an intermediate arm portion 12 and a revolving arm portion 11 rotatably connected to a leading end arm portion 13 formed at a wafer holding portion 13 a (FIG. 4).

As shown in FIG. 3, the revolving arm portion 11 and the intermediate arm portion 12 have main bodies formed of aluminum casings 11 a and 12 a, respectively. Accommodated in the inside of the respective casings 11 a and 12 a are supporting shafts 26 b and 29 b and rotational shafts 26 a and 29 which connect the revolving arm portion 11, the intermediate arm portion 12 and the leading end arm portion 13 respectively. Further, a rotational shaft 21 and a revolving shaft 22 installed at the base end side of the revolving arm portion 11 are connected to a driving mechanism 30 installed below the bottom portion of the second transfer chamber 44 and made up of, for example, a motor, which serves to rotate the shaft 21 and 22 independently (see FIG. 5). Further, installed in the casings 11 a and 12 a are timing belts 25 a and 25 b and pulleys 23, 24, 27 and 28 serving as the conveyance mechanism for transmitting a driving force from the above-stated driving mechanism, as illustrated in FIG. 3.

In the above-described configuration, if the rotational shaft 21 is driven in a state that the revolving shaft 22 is stopped, the revolving arm portion 11 and the wafer holding portion 13 a of the transfer arm 10 b are rotated in the same direction, while the intermediate arm portion 12 is rotated in the reverse direction to offset their rotations. As a result of the combination of these movements, the wafer holding portion 13 a makes an extending/contracting motion in a forward/backward direction, as illustrated in a broken line in FIG. 4. On the other hand, if the rotational shaft 21 and the revolving shaft 22 are rotated in the same direction, the wafer holding portion 13 a does not make the extending/contracting motion but the revolving arm portion 11 makes a rotating motion in a horizontal direction.

Further, as illustrated in FIG. 3, bearing portions 20 a to 20 g configured as, for example, bearings are interposed between the rotatably interconnected members. Further, each of the bearing portions 20 a, 20 b, 20 e and 20 f includes a magnetic seal unit, so that the atmospheric atmosphere in the inside of each of the casings 11 a and 12 a or in the inside of the cover member 31 accommodating the driving mechanism 30 therein is isolated from the vacuum atmosphere within the second transfer chamber 44.

Here, a stop position of the extensible/contractible wafer holding portion 13 a, i.e., a transfer position of the wafer W is controlled by a driving amount of the driving mechanism 30 (for example, a rotation amount of the motor) during a time period from an initiation of the extending operation of the transfer arm 10 b till its stop. The driving amount is set to optimize the transfer position of the wafer W at a preset control temperature (for example, 40° C. ). That is, the driving amount is set to allow the center of the transferred wafer W to be aligned with the center of the mounting table 51, for example.

As for the transfer arm 10 a operated as described above, respectively buried in each of the casings 11 a and 12 a, as shown in an overall view and an enlarged view of FIG. 3, are heaters 61 a and 61 b formed of, e.g., sheet type resistance heating elements, for maintaining the temperature of each of the arm portions 11 and 12 within a preset temperature range (for example, a temperature range of plus and minus 1.0° C. with respect to the aforementioned control temperature as a reference value). Each of the heaters 61 a and 61 b is connected with an external power supply unit 66 to be described later via a connection line 62.

Here, respectively installed at the revolving shaft 22 and the supporting shaft 26 b on the leading end side the revolving arm portion 11 are wiring paths 22 a and 26 c, which are hollow portions formed along the axial direction of respective shafts. Further, the cover member 31 and the rotational shaft 21 are provided with through holes 31 a and 21 a, respectively. The connection line 62 connected with the external power supply unit 66 is led into the rotational shaft 21 via the through holes 31 a and 21 a; passes the inside of the revolving shaft 22 via a lower opening of the wiring path 22 a; is led into the casing 11 a of the revolving arm portion 11 through an upper opening provided above the pulley 23; and is connected with the heater 61 a. Here, a reference numeral 63 a denotes a thermostat of, e.g., a bimetal type interposed between the connection line 62 and the heater 61 a, for carrying out a function of preventing overheating of the revolving arm portion 11 by stopping a power supply to the heater 61 a when its temperature reaches a preset stop temperature (e.g., about 50° C. which is above the upper limit of the aforementioned set temperature range).

Further, the connection line 62 is branched before the thermostat 63 a; is arranged in the casing 11 a; is led into the supporting shaft 26 b through a lower opening of the wiring path 26 c provided below the pulley 24; and is led into the casing 12 a of the intermediate arm portion 12 through an upper opening provided at the top surface of the pulley 27. The connection line 62 introduced into the casing 12 a is connected with the heater 61 b via the thermostat 63 b. With this configuration, formed in each of the arm portions 11 and 12, as illustrated in FIG. 5, is a circuit in which the heaters 61 a and 61 b and the thermostats 63 a and 63 b are combined with each other and connected with the power supply unit 66 in parallel. Further, in FIG. 3, connection lines constituting the mentioned circuits are shown by the single line for the simplicity of illustration.

Here, since a majority of the heat supplied from each of the heaters 61 a and 61 b does not escape to the ambient vacuum atmosphere, a heater or the like is not installed at the leading end arm portion 13 in the present embodiment, and the leading end arm portion 13 is indirectly heated by a thermal conduction from the arm on the base end side such as the intermediate arm portion 12 or the like. Here, it is needless to say that installation of a separate heater thermocouple at the leading end arm portion 13 to carry out the heating is also possible.

Furthermore, temperature detectors, e.g., thermocouples 64 a and 64 b are installed on the inner surfaces of the casings 11 a and 12 a in which the heaters 61 a and 61 b are buried, respectively, and also are connected with a signal line 65 shown by a broken line in FIG. 3 to output the temperatures of the casings 11 a and 12 a at respective installation positions as electric signals. The signal line 65 is led out of the transfer arm 10 b along the same path as the above-stated connection line 62. Moreover, the wiring of the connection line 62 or the signal line 65 is done within the transfer arm 10 b to form a winding portion or to be in a loose state lest each line should be cut off by being pulled by the rotation of the rotating shaft 21 or the revolving shaft 22, or the like.

In the above, though the detailed configuration of the transfer arm 10 b and the heating unit are illustrated, the transfer arm 10 a of the first substrate transfer apparatus 1 a has substantially the same configuration, and is extensible/contractible and rotatable, and it is also possible to maintain the temperature of each of the arm portions 11 and 12 within the set temperature range. Furthermore, in the first substrate transfer apparatus 1 a, a base sustaining thereon the transfer arm 10 a or the driving mechanism 30 is configured to be movable up and down and left and right.

FIG. 5 is a block diagram showing an electrically connected configuration each component according to a control of heating and operation of each of the substrate transfer apparatuses 1 a and 1 b. In addition to the above-stated function of controlling the overall operation of the substrate processing apparatus 4 including each of the substrate transfer apparatuses 1 a and 1 b, the control unit 7 carries out a function of controlling the temperatures of the heaters 61 a and 61 b by cooperating with the power supply unit 66 and a function of operating each of the transfer arms 10 a and 10 b according to a start-up manipulation sequence of the substrate processing apparatus 4 or a heating state of each of the arm portions 11 and 12. Besides, the power supply unit 66 carries out a function of controlling the power supply to each of the heaters 61 a and 61 b based on an instruction from the control unit 7.

The control unit 7 is composed of a computer including, for example, a central processing unit (CPU); programs (including a temperature control program 72 and an operation control program 73) regarding the above-described operations; and a memory 74. The temperature control program 72 and the operation control program 73 constitute step (command) groups related to the control of the operations of the first and second substrate transfer apparatuses 1 a and 1 b, that is, the heating of the arm portions 11 and 12 and the operation of the transfer arms 10 a and 10 b. These programs are installed in the computer by being stored in a storage medium 76 such as a hard disk, a compact disk, a magneto-optical disk, a memory card, or the like.

Further, the memory 74 is implemented by, e.g., a re-recordable flash memory, or the like, and the set temperature range previously stored in the memory 74 is read out by the computer. Here, the lower limit of the set temperature range is set to be at a temperature level (e.g., about 30° C.) higher than a temperature where the temperatures of the respective arm portions 11 and reaches an equilibrium state in the above-stated warm-up state, i.e., as a result of operating the transfer arms 10 a and 10 b for a long time without performing the heating by the heaters 61 a and 61 b.

The control unit 7 is connected with the thermocouples 64 a and 64 b of the transfer arms 10 a and 10 b or the driving mechanism 30 and also connected with the heaters 61 a and 61 b via the power supply unit 66. Further, the control unit is also connected with a display manipulation unit 75 for displaying various kinds of information to an operator or user, or receiving an instruction from the user via a soft-switch.

Now, the temperature control and the operation control of the respective substrate transfer apparatuses 1 a and 1 b, which are performed based on the above description, will be explained with reference to a flowchart of FIG. 6 illustrating a series of operations. When initiating a start-up manipulation of the substrate processing apparatus 4 after finishing, for example, a maintenance of the substrate processing apparatus 4 or the closing of factory (start), a supply of power to the substrate processing apparatus 4 including the first and second substrate transfer apparatuses 1 a and 1 b is begun (step S1). Then, initialization for previously storing exact transfer positions of the wafer W by the respective transfer arms 10 a and 10 b is carried out, and, at the same time, a temperature control of each of the arm portions 11 and 12 is begun (step S2).

Accordingly, the arm portions 11 and 12 of each of the transfer arms 10 a and 10 b are heated, and, at the same time, there is performed a warm-up operation in which each of the transfer arms 10 a and 10 b repeats extending/contracting or revolving operations without transferring the wafer W (step S3). Then, it is determined whether a temperature detection value by each of the thermocouples 64 a and 64 b falls within the set temperature range (step S4).

In the event that the temperature detection value has not been increased up to the set temperature range (No in step S4), the heating of the arm portions 11 and 12 and the warm-up operation are continued while prohibiting the transfer of the wafer W (step S3). If the temperature detection value had reached the set temperature range (Yes in step S4), the transfer of the wafer W is allowed. After the preparation of the process in the substrate processing chambers 45 a to 45 d or the like is completed, the processing of the wafer W is begun by the substrate processing apparatus 4, and the transfer of the wafer W is performed by each of the transfer arms 10 a and 10 b while performing the heating of the arm portions 11 and 12, respectively (step S5).

The substrate transfer apparatuses 1 a and 1 b regularly monitor the temperature detection values from the thermocouples 64 a and 64 b respectively at a preset time interval (step S6). If each temperature detection value is in the set temperature range (Yes in step S6), the heating of the arm portions 11 and 12 and the transfer of the wafer W are continued until it reaches planned stop time of the substrate processing apparatus 4 (step S5). Meanwhile, in the event that a temperature detection value from the thermocouples 64 a or 64 b of the transfer arm 10 a or 10 b falls out of the set temperature range (No in step S6), the transfer of the wafer W is stopped (step S7), and then the operation of the substrate processing apparatus 4 is stopped, and an occurrence of an abnormality is notified by the display manipulation unit 75 (step S8) and the series of operations are completed (End).

After the transfer of the wafer W is stopped, the cause of the abnormality occurrence can be investigated and measures thereto can be taken by the operator or a person in charge of equipment, and, afterward, the operations of the substrate processing apparatus 4 and the respective substrate transfer apparatuses 1 a and 1 b are resumed in the same sequence as the flowchart of FIG. 6. Further, in case that the temperatures of the arm portions 11 and 12 fall out of the set temperature range (No in step S6), for example, when the bimetals of the thermostats 63 a and 63 b reach the aforementioned stop temperature due to a rapid temperature rise, the power supply to the heaters 61 a and 61 b is stopped by the operation of the thermostats 63 a and 63 b.

In accordance with the present embodiment, the following effects can be attained. In the substrate transfer apparatuses 1 a and 1 b, the heaters 61 a and 61 b are installed at the arm portions 11 and 12 of the joint type transfer arms 10 a and 10 b, respectively, and the temperatures of the arm portions 11 and 12 are compulsively increased by heating them at the time of startup, thus allowing the transfer of the wafer W to be carried out in the set temperature range. Accordingly, when the operations of the respective substrate transfer apparatuses 1 a and 1 b are stopped for a long period of time and then resumed thereafter, for example, the distinction between the cool-down state and the warm-up state becomes substantially meaningless, so that it becomes possible to perform the transfer of the wafer W with an originally desired precision immediately after resuming the operation. Accordingly, since mounting positions of wafers W in the substrate processing chambers 45 a to 45 d become uniform between the wafers W, a high uniformity of the processing on the wafers W can be obtained. As described, the present invention has advantages when it is applied to the semiconductor manufacturing apparatuses, for example, the substrate processing apparatus 4 in the present embodiment, in which the deviation of the mounting position of the wafer W would affect the uniformity of the processing, however small the deviation is.

Moreover, since the transfer of the wafer W is stopped when the temperature of each of the arm portions 11 and 12 falls out of the set temperature range, it is possible to minimize the number of wafers W processed while their transfer positions are deviated. Further, since the thermostats 63 a and 63 b for preventing the overheating of the transfer arms 10 a and 10 b are installed at the heaters 61 a and 61 b, respectively, the heaters 61 a and 61 b can be stopped safely even in case of a rapid temperature rise which cannot be prevented only by the control of the power supply by the control unit 7.

Besides, in the present embodiment, since the lower limit of the set temperature range is set to be higher than the temperatures of the arm portions 11 and 12 in the warm-up state, it is possible to heat each of the arm portions 11 and 12 only by using a heating unit having a simple structure, such as a resistance heating element or the like. In addition, since the transfer position of the wafer W by each of the transfer arms 10 a and 10 b is set to be optimized at a predetermined control temperature within the set temperature range, the accuracy of the transfer portion of the wafer W can be improved, in comparison with the conventional case where the transfer arm or the like is adapted to be operable with some degree of fine controllability under whichever one of the different temperature conditions including the cool-down state and the warm-up state.

Moreover, since the heating of the arm portions 11 and 12 is performed while performing the warm-up operation of each of the substrate transfer apparatuses 1 a and 1 b, it is possible to start the transfer of the wafer W in the state similar to the conventional warm-up state including the other conditions which cannot be completely controlled only by satisfying the temperature condition, and to stabilize the transfer position of the wafer W. Further, though the present embodiment has been described for the scalar type transfer arms 10 a and 10 b for example, it is possible to install transfer arms of a frog leg type instead and to operate them while performing the heating by the heaters.

Further, though the present invention has been described for the case of using the resistance heating element or the like as the heating unit for heating the transfer arms 10 a and 10 b, it may be possible to install an additional cooling unit at the transfer arms. For example, there is a transfer arm having a motor in the casing 11 a or 12 a of the revolving arm portion 11 or the intermediate arm portion 12, respectively, as shown in FIG. 3, and for directly operating the intermediate arm portion 12 or the leading end arm portion 13 by the motor. This type of transfer arm may suffer a steep temperature rise because the inside of the revolving arm portion 11 or the intermediate arm portion 12 may be filled up with the heat from the motors. Therefore, it may be possible to install, in each of the arm portions 11 and 12, a cooling unit for cooling the motors by, e.g., ejecting compressed air to the surface of the motors, and to perform both the heating and the cooling of the transfer arm.

Moreover, in the present embodiment, though the heaters 61 a and 61 b serving as the heating units are installed only at the transfer arms 10 a and 10 b, it may be possible to heat the atmosphere in which the transfer arm 10 a is installed. For example, the above-stated first substrate transfer apparatus 1 a and the first transfer chamber 42 are integrally considered as a substrate transfer module, and a second heating unit 42 c made up of an air heater or the like is installed at an outlet of the fan filter unit 42 a. Based on a detection value of an in-chamber temperature by a second temperature detection unit 42 d installed in the first transfer chamber 42, the temperature of the first transfer chamber 42 can be regulated by the control unit 7 to be maintained in the same set temperature range as that for the arm portions 11 and 12 of the first substrate transfer apparatus 1 a. Further, instead of setting the inside of the second transfer chamber 44 shown in FIGS. 1 and 2 under the vacuum atmosphere, it is also possible to keep it under a nonreactive gas atmosphere of, e.g., a nitrogen gas and to control the supply temperature of the nonreactive gas such that the temperature of the second transfer chamber is kept in the set temperature range. By stabilizing the temperature around the transfer arm 10 a within the set temperature range, the heating of the transfer arm 10 a itself can be facilitated.

Further, the heaters 61 a and 61 b installed at the arm portions 11 and 12 of each of the transfer arms 10 a and 10 b can be used for other purposes than to improve the controllability of the substrate transfer apparatuses 1 a and 1 b. For example, in order to maintain a high vacuum state in a transfer chamber such as the second transfer chamber 44 of a type in which the wafer W is transferred under the vacuum atmosphere, there is performed a baking process for previously evaporating moisture particles adsorbed in the surface of components of the transfer chamber or the substrate transfer apparatus and for heating them at, e.g., about 100° C. Conventionally, the baking process has been implemented by, for example, warming the chamber main body by a cartridge heater or a sheet heater over several days. However, by directly heating the surface of each of the arm portions 11 and 12 up to a temperature level substantially identical with that by the baking process by using the heaters 61 a and 61 b installed at the transfer arms 10 a and 10 b, the time required for the baking process can be reduced. Further, at this time, the stop temperature of each of the thermostats 63 a and 63 b is set to be at a temperature level higher than an upper limit of a temperature for the mentioned baking process.

In addition, in the substrate processing chambers 45 a to 45 d, for example, corrosive components may be used or generated as a result of a reaction of a processing gas with moisture in the air or a slight amount of ammonia released from a human body. In such case, these components adsorbed in the surface of the wafer W in the substrate processing chambers 45 a to 45 d for example are dispersed into the transfer chambers 42 and 44 from the wafer W on the unloading path, resulting in a corrosion of the surface of the arm portions 11 and 12 and the like. Here, the corrosion may be prevented by setting the aforementioned set temperature range to be a range in which the adhesion of the corrosive components can be suppressed, and by heating, in case that the transfer arms 10 a and 10 b are used, the transfer arms 10 a and 10 b at a certain temperature in that range.

Moreover, in case that the transfer arms 10 a and 10 b are used in the atmosphere in which reaction products (including the aforementioned corrosive components) derived from the processing gas or the like are adhered, it may be possible to heat each of the arm portions 11 and 12 up to a temperature higher than the above-stated set temperature range and capable of dispersing the adhered components during a period while the transfer of the wafer W is not performed. In such case, the stop temperature of each of the thermostats 63 a and 63 b is set to be higher than the temperature where the adhered components are dispersed.

So far, the present embodiment has been described for the substrate transfer apparatuses 1 a and 1 b each including the joint type transfer arms 10 a and 10 b applied to the multi-chamber type substrate processing apparatus 4 or the like. However, the present invention can also be embodied by a substrate transfer apparatus 8 of a slide type, as shown in FIG. 7A. The slide type substrate transfer apparatus 8 can be used as, for example, a coating and developing apparatus for performing coating or development of a resist film with respect to, .e.g., a wafer W or a flat panel.

The slide type substrate transfer apparatus 8 includes a rotatable transfer base body 81 and a transfer arm 80 made up of three layers of substrate holding portions 82 a to 82 c installed at the transfer base body 81 to be movable back and forth. As shown in FIG. 7B, the substrate holding portions 82 a to 82 c are fastened via a connection member 85 to a moving body 84 which moves on a ball screw 83 in the transfer base body 81. By driving a motor 86 installed at the ball screw 83, the substrate holding portions 82 a to 82 c are slid, whereby the wafer W can be transferred into a processing module for coating a resist solution a developing solution on the wafer W or performing a heat treatment on the wafer W coated with these solutions. Further, FIG. 7B only shows one substrate holding portion 82 a and its driving mechanism for the simplicity of illustration.

In such slide type substrate transfer apparatus 8, a cool-down state and a warm-up state also exist. For example, in the warm-up state, a shaft constituting the ball screw 83 is extended by being expanded due to friction heat generated by a friction between the ball screw 83 and the moving body 84. In the cool-down state, on the other hand, the friction heat is radiated, so that the shaft is cooled down and returned to the original state. If the transfer position of the wafer W is deviated due to such a condition variation, non-uniformity between the wafers W may be generated in view of the film thicknesses of the resist films or development states thereof. Thus, for example, it is desirable to bury the heater 61 a serving as the heating unit or the thermocouple 64 a serving as the temperature detector in a casing constituting the transfer base body 81, as shown in FIG. 7B, and to connect them to the control unit 7 of the like, and to heat the transfer base body 81 prior to starting the transfer of the wafer W, to thereby allow the temperature of the transfer base body 81 to be maintained in the set temperature range during the transfer of the wafer W. Further, in FIG. 7B, like reference numerals are given to like parts having the same configurations as those in FIG. 3 and FIG. 5.

The present international application claims benefit of Japanese Patent Application Ser. No. 2007-077500, filed on Mar. 23, 2007, of which specification, claims and drawings are hereby incorporated by reference in its entirety. 

1. A substrate transfer apparatus including a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding a substrate, the apparatus comprising: a heating unit for heating the arm portion; a temperature detection unit for detecting a temperature of the arm portion; and a control unit for heating the arm portion by the heating unit prior to a start of a transfer of the substrate, allowing the transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and controlling the heating unit so as to maintain the temperature detection value within the preset temperature range, wherein the control unit controls the transfer arm to stop the transfer of the substrate if the temperature of the arm portion is out of the preset temperature range during the transfer of the substrate.
 2. The substrate transfer apparatus of claim 1, wherein the transfer arm is used under an atmosphere in which corrosive components are dispersed, and the preset temperature range is a temperature range in which adhesion of the corrosive components are suppressed.
 3. The substrate transfer apparatus of claim 1, wherein the transfer arm is used under an atmosphere in which a reaction product of a processing gas is adhered thereto, and control unit controls the heating unit to heat the arm portion at a temperature higher than the preset temperature range to disperse components adhered to the arm portion while the transfer of the substrate by the arm portion is not being performed.
 4. The substrate transfer apparatus of claim 1, wherein the transfer arm is used in a transfer chamber under a vacuum atmosphere, and the control unit heats the arm portion by controlling the heating unit to evaporate moisture of the arm portion in a step of depressurizing the transfer chamber.
 5. A substrate transfer module comprising: a substrate transfer apparatus including a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding a substrate, the apparatus comprising: a heating unit for heating the arm portion; a temperature detection unit for detecting a temperature of the arm portion; and a control unit for heating the arm portion by the heating unit prior to a start of a transfer of the substrate, allowing the transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and controlling the heating unit so as to maintain the temperature detection value within the preset temperature range; a transfer chamber for allowing a transfer of a substrate to be performed therein by the transfer arm; and a second heating unit for increasing a temperature of the inside of the transfer chamber and a second temperature detection unit for detecting the temperature of the inside of the transfer chamber, both of which are installed in the transfer chamber, wherein the control unit controls the second heating unit so as to maintain the temperature of the inside of the transfer chamber in the preset temperature range based on a temperature detection value obtained by the second temperature detection unit during the transfer of the substrate.
 6. A substrate transfer method for transferring a substrate by using a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding the substrate, the method comprising: detecting a temperature of the arm portion; heating the arm portion prior to a start of a transfer of the substrate; allowing the transfer of the substrate after the detected temperature of the arm portion reaches a preset temperature range; maintaining the temperature of the arm portion within the preset temperature range while heating the arm portion; and stopping the transfer of the substrate if the temperature of the arm portion is out of the preset temperature range during the transfer of the substrate.
 7. The substrate transfer method of claim 6, wherein the transfer arm is used under an atmosphere in which corrosive components are dispersed, and the preset temperature range is a temperature range in which adhesion of the corrosive components are suppressed.
 8. The substrate transfer method of claim 6, wherein if the transfer arm is used under an atmosphere in which a reaction product of a processing gas is adhered thereto, the arm portion is heated at a temperature higher than the preset temperature range to disperse components adhered to the arm portion while the transfer of the substrate by the arm portion is not being performed.
 9. The substrate transfer method of claim 6, wherein if the transfer arm is used in a transfer chamber under a vacuum atmosphere, the arm portion is heated to evaporate moisture of the arm portion in a step of depressurizing the transfer chamber.
 10. A substrate transfer method for transferring a substrate by using a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding the substrate, the method comprising: detecting a temperature of the arm portion by a first temperature detection unit; heating the arm portion prior to a start of a transfer of the substrate by a first heating unit; allowing the transfer of the substrate after the detected temperature of the arm portion reaches a preset temperature range; maintaining the temperature of the arm portion within the preset temperature range while heating the arm portion; performing the transfer of the substrate by the transfer arm in a transfer chamber; heating the inside of the transfer chamber by a second heating unit and detecting a temperature of the inside of the transfer chamber by a second temperature detection unit; and maintaining the temperature of the inside of the transfer chamber within the preset temperature range by the second heating unit based on a temperature detection value obtained by the second temperature detection unit during the transfer of the substrate, wherein the second heating unit and the second temperature detection unit are installed in the transfer chamber.
 11. A substrate transfer apparatus including a transfer arm of a joint type having a plurality of arm portions connected with a holding portion for holding a substrate, the apparatus comprising: a heating unit for heating one of the plurality of arm portions; a temperature detection unit for detecting a temperature of the one of the plurality of arm portions; a control unit for heating the one of the plurality of arm portions by the heating unit prior to a start of a transfer of the substrate, allowing the transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and controlling the heating unit so as to maintain the temperature detection value within the preset temperature range; and a second heating unit for heating the other of the plurality of arm portions and a second temperature detection unit for detecting a temperature of the other of the plurality of arm portions, both of which are installed at the other of the plurality of arm portions, wherein the control unit controls the second heating unit so as to maintain the temperature of the other of the plurality of arm portions in the preset temperature range based on a temperature detection value obtained by the second temperature detection unit during the transfer of the substrate.
 12. The substrate transfer apparatus of claim 11, wherein the transfer arm is used under an atmosphere in which corrosive components are dispersed, and the preset temperature range is a temperature range in which adhesion of the corrosive components are suppressed.
 13. The substrate transfer apparatus of claim 11, wherein the transfer arm is used under an atmosphere in which a reaction product of a processing gas is adhered thereto, and control unit controls the heating unit to heat the one of the plurality of arm portions at a temperature higher than the preset temperature range to disperse components adhered to the one of the plurality of arm portions while the transfer of the substrate by the transfer arm is not being performed.
 14. The substrate transfer apparatus of claim 11, wherein the transfer arm is used in a transfer chamber under a vacuum atmosphere, and the control unit heats the one of the plurality of arm portions by controlling the heating unit to evaporate moisture of the one of the plurality of arm portions in a step of depressurizing the transfer chamber. 